| 摘要 |
<p>PURPOSE:To enhance flatness of the surface of an object to be polished by providing an abrasive supply port on the peripheral side of a polishing plate thereby making it possible to supply sufficient quantity of abrasive between a polishing cloth and the polishing plate. CONSTITUTION:The waxless polishing apparatus comprises a rotatable turn table 3 applied with a cloth 2 for polishing an object 1 to be polished, a polishing plate 4 for holding the object 1, and a press mechanism 5 which can rotate freely while pressing the polishing plate 4 against the surface of the polishing cloth 2 at a predetermined pressure. Such a waxless polishing apparatus is further provided with a port 12 for supplying abrasive 6 at the peripheral side of the polishing plate 4. For example, a cover body 10 is provided surrounding the side parts of the polishing plate 4 and the press mechanism 5. A passage 11 for introducing the abrasive 6 is provided between the inner surface of the cover body 10 and the side surfaces of the polishing plate 4 and the press mechanism 5 and ring type supply ports 12 are provided along the peripheral side of the polishing plate 4.</p> |
