发明名称 VACUUM VAPOR DEPOSITION DEVICE FOR POLYGON MIRROR AND UNIFORM FORMATION OF VACUUM VAPOR DEPOSITED FILM
摘要 PURPOSE:To uniformly form the vacuum vapor deposited film with the vacuum vapor deposition device consisting of a polygon mirror. CONSTITUTION:The rotating speed of a stepping motor is accelerated by changing the frequency of the stepping motor to increase the rotating speed of the polygon mirror in the position where the reflection surface 8a of the polygon mirror 8 is paralleled with an adjusting slit plate 11 by the rotation of the stepping motor. The rotating speed of the stepping motor is so controlled as to be slowed down in the position where the adjacent surfaces, such as reflection surfaces 8b, 8a or 8a, 8c of the polygon mirror face the slit spacing(h), for example, when the adjacent surfaces face the slit spacing (h) at about 60 deg. angle in the case the rotary polyhedral mirror is a hexahedron. The thickness of the vacuum vapor deposited film to be deposited by evaporation on the surface of the polygon mirror by passing the slit spacing (h) of the adjusting slit plate 11 is thus controllable and, therefore, the distribution thereof is made constant.
申请公布号 JPH05249395(A) 申请公布日期 1993.09.28
申请号 JP19920081600 申请日期 1992.03.03
申请人 COPAL ELECTRON CO LTD 发明人 TOKITA AKIO;TAGUCHI MASAMICHI
分类号 C23C14/54;G02B26/10;G02B26/12;(IPC1-7):G02B26/10 主分类号 C23C14/54
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