| 摘要 |
A filament reactor for producing diamond using chemical vapor deposition (CVD) techniques. The reactor includes a closed reaction chamber with at least one gas inlet and at least one exhaust port, two substrates disposed in the reaction chamber, and a resistance heating device in the form of a plurality of filaments positioned between the substrates. A preheater unit is located adjacent to the gas inlet for heating the gas mixture entering the reaction chamber. By preheating the gas mixture, the temperature of the substrates and the concentration of the hydrocarbon species fluxes are kept relatively uniform, thus ensuring high quality diamonds of uniform thicknesses. The preheater unit can be a serpentine tube made of a metal having a high thermal conductivity and wrapped with a resistance heating element. <IMAGE> |
