Photoresist for optical disc and method of preparing optical disc utilizing photoresist.

摘要

A photoresist adapted for manufacture of an optical disc original comprises a photosensitive material and a base resin, in which a molecular weight distribution (weight average molecular weight Mw / number average molecular weight Mn) in the base resin has a value less than 5.8, preferably less than 5.0. The photosensitive agent has an esterification ratio of more than 80% and preferably more than 90%. The base resin is composed of a cresol novolak resin and the photosensitive agent is a reactant formed by reacting a 1,2-naphthoquinonediazido-5-sulfonylchloride to a nonbenzophenon series ballast compound having 30 to 40 weight parts with respect to the cresol novolak resin of 100 weight parts. An optical disc is prepared by the steps of coating a positive-type photoresist on a glass substrate (100) to form a resist film, forming a pit pattern through a light exposure to the resist film, developing the resist film after the light exposure to form a resist original, effecting a plating treatment to the resist original to form a stamper(104) by an electrocasting treatment, forming a replica disc through an injection molding process by utilizing the stamper (104), forming a reflection film on the replica disc, and forming an overcoat layer on the reflection film. <IMAGE>