| 摘要 |
PURPOSE:To provide a reticle capable of exposing without unfocusing even to a semiconductor substrate having a larger step difference than the depth of the focus of an exposer. CONSTITUTION:When a repeated pattern region 4 with a chromium film 2 and a chromium oxide film 3 and a peripheral circuit pattern region 5 are formed on a quartz substrate 1 to obtain a reticle for a semiconductor integrated circuit, a transparent film 7 is formed on the repeated pattern region 4. The optical path length of light passing the film 7, that is, the region 4 is made longer than that of light passing the region 5 and a focal plane on a semiconductor substrate is heightened. |
