| 摘要 |
PURPOSE:To provide a light emitting material able to be formed with a large area and at a low cost and a manufacturing method thereof. CONSTITUTION:This light emitting material of a large area consists of a multilayer film 5 where a laminate unit consisting of an amorphous silicon hydride layer 3 and an amorphous silicon hydride layer 4 containing fine crystalline silicon is formed on a glass substrate 1 or on a glass substrate 1 having a formed transparent electrode 2. Further, as to a manufacturing method of a light emitting material, the hydride amorphous silicon layer 3 is formed on the glass substrate or on the glass substrate 1 having a formed transparent electrode 2, for instance, by a plasma CVD method, thereafter, a process to reform a surface layer of the hydride amorphous silicon layer 3 into the hydride amorphous silicon layer 4 containing fine crystal silicon by EGR plasma is repeated in order to form the multilayer film 5. |
