| 摘要 |
PURPOSE:To provide high optical density, low reflectivity, high dimensional accuracy and high contrast by providing a transparent substrate and a light shielding layer which is formed on the transparent substrate and internally has metallic particles. CONSTITUTION:A photosensitive resist layer 3 having 0.1 to 5.0mum thickness is first formed on the transparent substrate 3 by applying a photosensitive resist contg. a hydrophilic resin, a compd. having a diazo group or azide group and a metallic compd. to serve as a catalyst for electroless plating on the substrate and drying the coating. The photosensitive resist layer 3 is then exposed via a mask 9 for a black matrix. This transparent substrate 13 is brought into contact with an electroless plating liquid, by which the metallic particles of the electroless plating are deposited in the exposed parts and the light shielding layer (black matrix) 14 is formed. |
