发明名称 Method for making an improved high voltage thin film transistor having a linear doping profile
摘要 An improvement in a self-passivated high voltage semiconductor device is set forth with a thinned SOI layer having a linear lateral doping region coated with an oxide layer and a field plate being a part of the gate electrode layer. A high voltage SOI semiconductor device is formed having freedom from external electric fields.
申请公布号 US5246870(A) 申请公布日期 1993.09.21
申请号 US19910811554 申请日期 1991.12.20
申请人 NORTH AMERICAN PHILIPS CORPORATION 发明人 MERCHANT, STEVEN L.
分类号 H01L21/336;H01L29/06;H01L29/08;H01L29/40;H01L29/423;H01L29/739;H01L29/78;H01L29/786;H01L29/861 主分类号 H01L21/336
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