X-ray permeable membrane for X-ray lithographic mask

摘要

An X-ray permeable membrane for an X-ray lithographic mask consisting of an inorganic thin film obtained by the sputtering method using a target and consisting of silicon carbide and carbon, said target consisting of silicon carbide and carbon in a molar ratio of 99.9:0.1 to 70:30, having a transmission of at least 37% at a light wavelength of 633 nm and a tensile strength of 1x108 to 1x1010 dyn/cm2, and the membrane consisting of a silicon carbide constituted form silicon and carbon in a molar ratio in the range form 50.1:49.9 to 49.9:50.1.