发明名称 |
POLISH CONTAINING HIGHLY ADSORPTIVE POLYMER |
摘要 |
A polish composition which includes discrete particles of a highly cross-linked macroporous hydrophobic polymer. The particles are of a first predetermined average diameter, and the polymer particles have entrapped therein and dispersed uniformly throughout an active organosilicon ingredient. The composition also includes a coacervating agent mixed with the polymer particles in an amount sufficient to cause the polymer particles to collect forming dense clusters of coacervated particles of a second predetermined average diameter, the second predetermined average diameter being substantially in excess of the first predetermined average diameter.
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申请公布号 |
US5246972(A) |
申请公布日期 |
1993.09.21 |
申请号 |
US19900506032 |
申请日期 |
1990.04.06 |
申请人 |
DOW CORNING CORPORATION |
发明人 |
CIFUENTES, MARTIN E.;KASPRZAK, KENNETH A.;SMITH, JANET M. |
分类号 |
C08K9/10;C08K5/544;C08K9/08;C08L83/04;C08L101/00;C09G1/12;C09G1/16 |
主分类号 |
C08K9/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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