发明名称 Method for preparing dry lithographic plates.
摘要 <p>A method for preparing a dry PS plate which comprises an aluminum plate as a substrate, wherein the method comprises the steps of degreasing at least one side of she aluminum substrate to which a light-sensitive layer is applied with an aqueous solution of an acid and then applying a light-sensitive layer and an ink-repellent layer to the degreased substrate. The dry PS plate comprising an aluminum plate as a substrate prepared by the method permits the substantial improvement of coating properties of films applied onto the aluminum plate, developability and half-tone dot reproduction as well as storage stability of these properties.</p>
申请公布号 EP0560347(A1) 申请公布日期 1993.09.15
申请号 EP19930103896 申请日期 1993.03.10
申请人 FUJI PHOTO FILM CO., LTD. 发明人 OKUNO, KEI;SAKAKI, HIROKAZU
分类号 B41N3/03;B41N1/00;G03F7/00;G03F7/075 主分类号 B41N3/03
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