| 摘要 |
PURPOSE:To use a positive-type resist when a hole pattern is formed by using a phase shift reticle by a method wherein a light flux which is passed near an optical axis is shielded out of light fluxes which are passed through a Fourier transform face with reference to a reticle pattern. CONSTITUTION:In a phase shift reticle R, a phase shift transmission part (b) is formed in a substratum transmission part (a). A light-shielding plate FL is installed near a pupil face EP as a Fourier transform corresponding face with reference to a reticle pattern in a projection optical system PL; a beam of light near an optical axis is cut off. Consequently, regarding an amplitude distribution in the pupil face EP, an amplitude near the optical axis AX is removed completely. A negative amplitude distribution having a very small width as the inverse Fourier transform of the amplitude distribution on the pupil face EP is generated on the face of a wafer W. Since the intensity of a projection image is the square of the absolute value of an amplitude distribution, a very small and bright pattern is formed. Thereby, a very fine hole pattern can be formed by using a positive-type resist. |
