METHOD OF FORMING DIFFUSION REGION OF SEMICONDUCTOR DEVICE BY SOLID-PHASE DIFFUSION,申请号JP19920033355-传众专利搜索

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发明名称	METHOD OF FORMING DIFFUSION REGION OF SEMICONDUCTOR DEVICE BY SOLID-PHASE DIFFUSION
摘要
申请公布号	JPH05234927(A)	申请公布日期	1993.09.10
申请号	JP19920033355	申请日期	1992.02.20
申请人	MITSUBISHI ELECTRIC CORP	发明人	SENBA SHINJI
分类号	H01L21/22;H01L21/225;H01L31/18;(IPC1-7):H01L21/22	主分类号	H01L21/22
代理机构		代理人
主权项
地址

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