| 摘要 |
PURPOSE:To enhance the accuracy of an alignment operation by a method wherein, when a misalignment amount in a PR process is read out, readout patterns are arranged so that a relative displacement amount with reference to a prior process can be confirmed with reference to a displacement in a direction which could be confirmed only with reference to one's own process in conventional cases. CONSTITUTION:Mispalignment readout patterns are arranged in opposite positions on two opposite sides on a semiconductor pellet 1; they are formed so as to be adjacent, such as readout patterns 3, 5, when a wafer is exposed. Displacement amounts on opposite sides of the pellet are compared, and a displacement amount theta with reference to a prior process is found. |
