| 摘要 |
PURPOSE:To uniformly provide a developer film on an exposed resist film applied on a substrate in a short time. CONSTITUTION:A developing device develops an exposed resist film 2 applied on a substrate 1, and comprises a discharge port 3b at a lower wall of a conduit 3a of chemicals supply means 3 vertically movably arranged above the substrate 1 to allow developer 5 or rinsing solution 6 to flow down therefrom. It is received by a top of a chemicals diffusing member 4 bent down at its peripheral wall to be extended and vertically hung from the means 3 through an arm 4a, and diffused to its skirt to be scattered on the film 2 above the substrate rotating at a low speed to form a developer film 5a. In the case of cleaning, the member 4 is horizontally disposed by avoiding the flowing-down solution 6. |
