发明名称 |
Positive type resist composition. |
摘要 |
<p>A positive type resist composition comprising an alkali-soluble resin and a quinonediazide compound, wherein the alkali-soluble resin containing resin (A) is obtainable through a condensation reaction with at least one phenol compound represented by the following general formula (I): <CHEM> wherein R1 to R3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one compound represented by the following general formula (II): <CHEM> wherein R4 represents a hydrogen atom, an alkyl group having 1-4 carbon atoms or a phenyl group, R5 to R7 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and n represents 1 or 2, and an aldehyde compound. This composition is excellent in the balance between performances such as sensitivity, heat resistance and profile, and is free from scum.</p> |
申请公布号 |
EP0559204(A1) |
申请公布日期 |
1993.09.08 |
申请号 |
EP19930103508 |
申请日期 |
1993.03.04 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
OSAKI, HARUYOSHI;MORIUMA, HIROSHI;UETANI, YASUNORI |
分类号 |
G03F7/023;C08G8/04;G03F7/039;H01L21/027 |
主分类号 |
G03F7/023 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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