发明名称 Plate-making method of dry lithographic plate and plate-making apparatus.
摘要 <p>A method for developing a dry PS plate using an automatic developing machine comprises the steps of pretreating an imagewise exposed dry PS plate with warm water of 25 to 70 DEG C which consists essentially of water and then removing silicone rubber while sprinkling a developing water consisting essentially of water. The use of a heater having a high capacity is not required even if the dry PS plate is processed in an automatic developing machine. The method is thus profitable from the viewpoint of economy and environmental protection. Moreover, a dry lithographic plate which is highly excellent in reproduction can be obtained by elevating the temperature of the water for the pretreatment. &lt;IMAGE&gt;</p>
申请公布号 EP0559153(A1) 申请公布日期 1993.09.08
申请号 EP19930103315 申请日期 1993.03.02
申请人 FUJI PHOTO FILM CO., LTD. 发明人 YOSHIDA, SUSUMU
分类号 G03F7/00;G03F3/10;G03F7/30;G03F7/38 主分类号 G03F7/00
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