| 摘要 |
PURPOSE:To provide a manufacturing method of a quartz group mirror waveguide with high arrangement accuracy for the mirror. CONSTITUTION:When the mirror is formed at a folding back part 4a of a quartz group folding back waveguide 4 which is embedded in a quartz group clad on which a mask layer 10 is formed with aligning patterns 6 for formation of the mirror as reference, only the parts 14, 14' just above the aligning patterns in the mask layer 10 are carried out with an etching treatment in a state of without forming mask to form a slit for mirror. Subsequently a material for mirror is applied on the slit for mirror to form the mirror. Consequently since the mask layer 10 of a high reflective material is not present just above the aligning pattern, visual recognition of the aligning pattern is easily performed from that place and the positioning is carried out with high accuracy. |
