发明名称 ELECTRODE PLATE FOR PLASMA-ETCHING
摘要 PURPOSE:To perform uniform etching, to eliminate unsatisfactory etching rates and to increase the life of an electrode plate. CONSTITUTION:An electrode plate for plasma-etching has a disclike electrode plate body 1 made of vitreous carbon of high purity and formed with many through holes 4 each having a miniature diameter. A plurality of spherical recesses 5 are formed on an inner peripheral surface of each hole 4 thereby to facilitate concentration of charge and to increase a charge area on the plate.
申请公布号 JPH05226294(A) 申请公布日期 1993.09.03
申请号 JP19910268857 申请日期 1991.09.20
申请人 TOSHIBA CERAMICS CO LTD 发明人 ICHIJIMA MASAHIKO;SASAKI YASUMI;SOTODANI EIICHI;KASAHARA MASATOSHI;MAKITA RITSURO
分类号 H01L21/302;H01J37/32;H01L21/3065 主分类号 H01L21/302
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