发明名称 |
ELECTRODE PLATE FOR PLASMA-ETCHING |
摘要 |
PURPOSE:To perform uniform etching, to eliminate unsatisfactory etching rates and to increase the life of an electrode plate. CONSTITUTION:An electrode plate for plasma-etching has a disclike electrode plate body 1 made of vitreous carbon of high purity and formed with many through holes 4 each having a miniature diameter. A plurality of spherical recesses 5 are formed on an inner peripheral surface of each hole 4 thereby to facilitate concentration of charge and to increase a charge area on the plate.
|
申请公布号 |
JPH05226294(A) |
申请公布日期 |
1993.09.03 |
申请号 |
JP19910268857 |
申请日期 |
1991.09.20 |
申请人 |
TOSHIBA CERAMICS CO LTD |
发明人 |
ICHIJIMA MASAHIKO;SASAKI YASUMI;SOTODANI EIICHI;KASAHARA MASATOSHI;MAKITA RITSURO |
分类号 |
H01L21/302;H01J37/32;H01L21/3065 |
主分类号 |
H01L21/302 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|