| 摘要 |
PURPOSE: To attain a good development by measuring and distributing a fixing agent on a substrate surface to prepare the surface while rotating a glass substratd at a relatively low speed and drying the surface by rotating the substrate after removing the fixing agent. CONSTITUTION: While an optical disk master 11 is kept rotated at a relatively low speed in order to develop an exposed photoresist layer 15, the photoresist layer 15 is first developed partially by applying water to the photoresist layer 15 and is finally subjected to complete development by applying only developer soln. thereon. The developed photoresist layer 15 is then washed with the water to get rid of the remaining developer soln. and finally, the developed photoresist layer 15 is dried by rotating the substrate at a relatively high speed. As a result, the good development is attained by the simple method without the occurrence of the unequal development in the photoresist layer. |
