| 摘要 |
PURPOSE:To efficiently evaluate the characteristics of a photoresist to be used in a short time in a step before an optical disk of a final product is obtained. CONSTITUTION:A resist film 20 is formed on a glass substrate 10 (resist film forming process 1), after that, the resist film 20 is exposed while changing exposure stepwise and a stair like semi-exposed part 30 is formed by developing processing (semi-exposed part forming process 2), next, the surface roughness of the semi-exposed part 30 is measured (surface roughness measuring process 3). |
