发明名称 PELLICULAR MEMBRANE FOR LITHOGRAPHY
摘要 <p>PURPOSE:To obtain a pellicular membrane having sufficient transmissivity and solvent resistance even in a short-wavelength region and excellent in contamination resistance and dustproofness by using a polymer contg. a specified fumaric diester unit. CONSTITUTION:The membrane consists of a polymer contg. a fumaric diester unit shown by the formula. In the formula, R1 and R2 are the same or different groups and are 1-12C alkyls, 3-12C cycloalkyls or the alkyls or cycloalkyls with a part or the whole of the hydrogen atoms substituted by halogen atoms. The content of the fumaric diester unit in the polymer constituting the pellicular membrane is controlled to 21-100wt.% based on the entire polymer. At <20wt.%, sufficient transmissivity, etc., are not obtained in the short-wavelength region. The pellicular membrane is a uniform thin membrane, has excellent transmissivity in the visible region and UV region of <250nm wavelength and is capable of dealing with a light source for lithography and the short- wavelength light source of an excimer laser, etc.</p>
申请公布号 JPH05224400(A) 申请公布日期 1993.09.03
申请号 JP19920027998 申请日期 1992.02.14
申请人 NIPPON OIL & FATS CO LTD 发明人 GOTO YOSHITAKA;AMAYA NAOYUKI
分类号 C08F222/14;C08F22/10;G03F1/62;H01L21/027 主分类号 C08F222/14
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