摘要 |
Continuous composite coating appts. for coating continuous strip (S) has a pair of strip supply-take-up devices (1a,1b) and at least two of an ion plating coating zone (2), a sputtering coating zone (3), and a plasma chemical vapour deposition zone (4) arranged in series in the direction of strip movement, at least two of the zones being arranged so as to effect coating only on the underside of the passing strip. Partition walls (14) are located between adjacent coating zones and strip supply-take-up devices and adjacent coating zones. The walls have slits (18) which allow the strip to pass while maintaining a desired vacuum level in each zone. Each slit has upper and lower edges which are spaced apart so as not to interfere with the passage of the strip and each partition wall is provided with a pair of guide rollers (19) in the vicinity of the upper edge of each slit spaced from each other in the direction of strip movement. The arrangement ensures that the strip runs in a tensed state between the supply and take-up devices moving through the coating zones along a path which is slightly convex downwards, the guide rollers only contacting the upper side of the strip.
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