发明名称 Thin film layer deposition - using acoustic waves formed by local pulsed heating at substrate surface through laser beams
摘要 In the development of thin film layers, together with photo-acoustic assistance, acoustic waves are directed across the surface of the substrate to be coated during deposition. The waves are formed by local pulsed heating through laser beams directed at the substrate. USE/ADVANTAGE - The thin film layers are deposited for special applications with specific characteristics such as conductivity, magnetic, piezo-electric, ferro-electric, optical etc. The technique does not require interdigital converters to deposit thin film layers. The acoustic waves give thin film layer deposition on substrates which are not piezo-electric.
申请公布号 DE4205832(A1) 申请公布日期 1993.09.02
申请号 DE19924205832 申请日期 1992.02.26
申请人 INSTITUT FUER FESTKOERPER- UND WERKSTOFFORSCHUNG DRESDEN EV, O-8027 DRESDEN, DE 发明人 WEIHNACHT, MANFRED, DR.SC.NAT., O-8019 DRESDEN, DE;FRANKE, KURT, DR.RER.NAT., O-8019 DRESDEN, DE;BESOLD, JUERGEN, DR.RER.NAT., O-8606 SOHLAND, DE
分类号 B01J19/10;C23C14/08;C23C14/22;C30B13/22 主分类号 B01J19/10
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