发明名称 Semiconductor optical integrated device and method of manufacture thereof, and light receiver using said device.
摘要 <p>Disclosed is a semiconductor optical integrated device and method of fabricating the device, the device having a plurality of quantum well structures, formed on a single substrate, acting as optical waveguides, the plurality of quantum well structures respectively having different lattice mismatches with the substrate and/or different strains (e.g., respectively compressive strain and tensile strain). The method includes selectively depositing the quantum well structures by, e.g., organometallic vapor phase epitaxy on growth regions of the substrate, the growth regions being defined by insulating layer patterning masks, with a width of the growth regions and/or a width of the patterning mask being different for the different quantum well structures. Each quantum well structure includes quantum well layers of III-V or II-VI compound semiconductor material, the Group III or Group II elements each including at least two elements, one having a relatively large atomic diameter and another having a relatively small atomic diameter. Also disclosed is a light receiver that can independently absorb TE-mode and TM-mode light in series, which can be used in a polarized-wave diversity receiver for coherent optical communication. &lt;IMAGE&gt;</p>
申请公布号 EP0558089(A2) 申请公布日期 1993.09.01
申请号 EP19930103158 申请日期 1993.02.26
申请人 HITACHI, LTD. 发明人 AOKI, MASAHIRO;SANO, HIROHISA;SAKANO, SHINJI;SUZUKI, MAKOTO;TAKAHASHI, MAKOTO;UOMI, KAZUHISA;IDO, TATEMI;TAKAI, ATSUSHI
分类号 G02F1/017;H01L31/0352;H01L33/00;H01S5/026;H01S5/10;H01S5/12;H01S5/227;H01S5/34;H01S5/343;H01S5/40;H01S5/50;(IPC1-7):H01L21/20;G02F1/025;H01S3/19 主分类号 G02F1/017
代理机构 代理人
主权项
地址