发明名称 LAMINATION OF A PHOTOPOLYMERIZABLE SOLDER MASK LAYER TO A SUBSTATE CONTAINING HOLES USING AN INTERMEDIATE PHOTOPOLYMERIZABLE LIQUID LAYER
摘要 A process is disclosed for applying a preformed photopolymerizable solder mask film and a photosensitive liquid to a printed circuit substrate containing a plurality of holes wherein reduced failure is obtained in photopolymerized areas of the solder mask film above the holes as determined after a soldering operation. The photosensitive liquid contains at least one ethylenically unsaturated compound capable of forming a high polymer by addition polymerization and a first photoinitiator system which has an absorption maximum in a first spectral region. The preformed photopolymerizable film contains at least one ethylenically unsaturated compound capable of forming a high polymer by addition polymerization and a second photoinitiator system, such that the preformed photopolymerizable film has an absorption maximum in a second spectral region and is activated by actinic radiation therein and has an absorption minimum in the first spectral region and transmits actinic radiation therein.
申请公布号 US5240817(A) 申请公布日期 1993.08.31
申请号 US19910811358 申请日期 1991.12.20
申请人 E. I. DU PONT DE NEMOURS AND COMPANY 发明人 STOUT, GARY;ASHCRAFT, ROBERT W.
分类号 G03F7/16;H05K3/00;H05K3/28;H05K3/34 主分类号 G03F7/16
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