发明名称 ETCHING METHOD
摘要 PURPOSE:To provide a method capable of laser-beam etching a double layered base material consisting of a metallic base layer and an insulating film layer having a comparatively large area. CONSTITUTION:The double layered base material 2 consisting of the metallic base material layer and the insulating 1 film layer is wound on the side wall of a columnar rotating body 1. The rotating body 1 is rotated while being moved back and forth in the direction of the rotating axis and a laser beam such as the ultraviolet ray laser beam irradiates on the wound base material 2 with a photomask 3.
申请公布号 JPH05220590(A) 申请公布日期 1993.08.31
申请号 JP19920057454 申请日期 1992.02.10
申请人 NITTO DENKO CORP 发明人 AMINO ICHIRO;TAKAYAMA YOSHINARI
分类号 B23K26/00;B23K26/38;C23F4/02;H05K3/08 主分类号 B23K26/00
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