发明名称 PLASMA TREATMENT DEVICE
摘要 <p>PURPOSE:To prevent breakage of a susceptor and burning/short circuit, etc., of an electrostatic chuck sheet and further to improve yield by preventing generation of particle. CONSTITUTION:A susceptor 14 is a disc body which is formed of a thick wafer mount base 14a and a thin brim part or a flange part 14b integrally. A peripheral part 14c of an upper side of the wafer mount base 14a, that is, a wafer mount surface is formed to a curved surface of a large curvature radius. The wafer mount surface of the susceptor 14 is crowned with an electrostatic chuck sheet 20 and a semiconductor wafer 22 is mounted on the electrostatic chuck sheet 20. The electrostatic chuck sheet 20 is formed to a solid configuration whose peripheral part 20d covers the curved peripheral part 14c of the susceptor 14 and alamid resin before crystallization is used as a material of high polymer film of the sheet. The alamid resin is a swelling gel film before it is dried and thermally treated and crystallization treatment of polymer is not performed; therefore, deep drawing is possible.</p>
申请公布号 JPH05217951(A) 申请公布日期 1993.08.27
申请号 JP19920309257 申请日期 1992.10.23
申请人 TOKYO ELECTRON LTD;TOKYO ELECTRON YAMANASHI KK 发明人 ARAMI JIYUNICHI;FUKAZAWA KAZUO
分类号 B23Q3/15;H01L21/302;H01L21/3065;H01L21/68;H01L21/683 主分类号 B23Q3/15
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