发明名称 IMPURITY DOPING METHOD
摘要 PURPOSE:To improve activation ratio of impurity atom doped to a compound semiconductor crystal. CONSTITUTION:A ZnSe crystal 1 is doped with 0 atom, for example, at high concentration as p-type impurities to make at least a part thereof exist in an interstitial position. Then, atomic vacancy is formed in at least an Se atom position by irradiating electronic beam 2 to the ZnSe crystal 1. Thereafter, at least a part of 0 atom existing in the interstitial position is put in the atomic vacancy for activation.
申请公布号 JPH05218501(A) 申请公布日期 1993.08.27
申请号 JP19920046170 申请日期 1992.01.31
申请人 SONY CORP 发明人 MIYAJIMA TAKAO
分类号 H01L21/423;H01L21/425;H01L21/477;H01L33/28;H01L33/32 主分类号 H01L21/423
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