| 摘要 |
PURPOSE:To provide an electron beam plotting device which precisely plots an integrated circuit pattern on the specified position of a mask or a reticle substrate. CONSTITUTION:A laser beam is emitted from a laser beam irradiating device 64 while a motor 62 is driven and a stage 50 is moved first in order to align the substrate 2. A substrate recognizing part 72 recognizes the end edge of the substrate 2 based on the change of the condition of the laser beam made incident on a detector 66. A controlling part 76 converts information about the end edge of the substrate 2 into positional information based on the number of the revolution of the motor 62, and calculates the rotating deviation angle of the substrate 2 and the central position of the substrate 2, etc., with respect to a specified direction. |
