| 摘要 |
PURPOSE:To enhance a form improvement effect and resolution by combining such as naphthoquinonediazido-derived group, with an oligomer obtained by combining hydroxybenzene type rings with each other together with methylene groups to obtain multifunctions. CONSTITUTION:The photosensitive compound is obtained by combining the photosensitive groups having photosensitivity to light in a desired wavelength region, such as naphthoquinonediazido derived groups, with the oligomer composed of the naphthoquinonediazido hydroxybenzene type rings (HOC6H4-) each combined with each other together with methylene groups. This compound is used for a balasting material for a cresol novolak type resist, and since it can be multifunctionallized as compared with the hydroxy-benzophenone without raising esterification rate too much and it is comparatively low in molecular weight, the form improvement effect due to baking after exposure can be well attained. |
