发明名称 SEMICONDUCTOR MANUFACTURING DEVICE
摘要 <p>PURPOSE:To prevent the adhesion of contamination on a rear surface of one wafer to the rear surface of the other wafer by a method wherein a wafer holder is provided with stoppers for holding one of every two sheets of wafers and a wafer carrier is converted. CONSTITUTION:A first stopper 3 blockades one of every two grooves 6 for wafers of a wafer holder 1 while the wafers are supported in the grooves 6 for wafers, which are blockaded. A second stopper 2 blockades all of the grooves 6 for wafers of the wafer holder 1 simultaneously to support the wafers in the wafers grooves 6. A wafers carrier rotating mechanism 9 converts a wafers carrier 4 about the vertical shaft thereof. Thus, the wafers, received in the wafers carrier, are treated under a condition that the front surface of the wafers is opposed to the rear surface of the other wafers.</p>
申请公布号 JPH05217999(A) 申请公布日期 1993.08.27
申请号 JP19920056309 申请日期 1992.02.06
申请人 NEC YAMAGUCHI LTD 发明人 KATO MINORU
分类号 H01L21/306;H01L21/304;H01L21/677;H01L21/68 主分类号 H01L21/306
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