发明名称 Semiconductor device having reinforced getter effect - comprises substrate having main surface and lower oxide layer surface with layer of getter material on oxide layer
摘要 Semiconductor device (I) comprises: (a) a substrate (2) of semiconductor material having a main surface (7), suitable for forming semiconductor appts. on it, and a lower surface (9) having a natural oxide layer (3) on it and of thickness of not more than 10 Angstroms; and (b) a layer of getter material (5) on the oxide layer (3). Prodn. of a semiconductor substrate of a wafer (1) made of semiconductor material is also claimed. ADVANTAGE - The getter effect is reinforced.
申请公布号 DE4304849(A1) 申请公布日期 1993.08.26
申请号 DE19934304849 申请日期 1993.02.17
申请人 MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP 发明人 KUSAKABE, KENJI, ITAMI, HYOGO, JP
分类号 H01L21/322 主分类号 H01L21/322
代理机构 代理人
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