| 摘要 |
A positive type resist composition comprising an alkali-soluble novolac resin, a quinonediazide compound and a compound represented by general formula (I): (I) wherein Y1 to Y10 each represent a hydrogen atom, a hydroxyl group or an alkyl group, provided that at least one of Y1 to Y10 is a hydroxyl group, and X represents one of the groups represented by the following formulas: and wherein R1 to R3 independently of one another each represent a hydrogen atom or an alkyl group, provided that, as measured by GPC, the pattern area of the component having a molecular weight, converted to polystyrene, 1,000 or below in the alkali-soluble novolac resin is 25% or less based on the total pattern area of the novolac resin from which the pattern area of the unreacted phenol compound is excepted. This positive type resist composition is excellent in the balance between performances such as sensitivity, resolution, heat resistance and adhesive property.
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