| 摘要 |
This new developer for quinone diazide type positive photosensitive resin has advantage of inhibiting undeveloped photosensitive resin residue (sucum). The developer comprises quinone diazide sensitizer, novolac binder resin, 1-10 wt. pts tertiary ammonium solution of formula (I), and 0.01-5 wt. pts azacycloketone deriv. of formula (II). In formula, R is C1-4 alkyl or H; m,n = 2,3,4; X=2n-1; Y= 2m-1. Anionic surfactant, stabilizer, and solubilizer can be added.
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