| 摘要 |
PURPOSE:To effect the durable correction in a short time by carrying out cleaning of a defect part of a mask and formation of a light screening film continuously in the same container. CONSTITUTION:While holding a mask 7 in the upper part of a correction chamber 8, the air of the chamber is exhausted and the correcting substance (bisbenzene chromium) 10 is evaporated by heating. A focusing point of laser beams 20 is adjusted to the defect by observation by means of an optical system 23. The chamber 8 is kept at 1X10<-3>Torr or under and O2 is introduced into a chamber 34. RF electric field is applied to electrodes 35 and 36 to convert O2 into O+O3 which is supplied to the chamber 8. Ultraviolet rays 32 are focused at the defect part by a mirror 31 and O3 in the optical path is decomposed. The adhering contaminator is eliminated by a pump 13 after decomposition and oxidation and thus the defect part is cleaned and activated chemically. After eliminating the residual O3 and O2, the correcting substance 10 is introduced and under 1X10<-2>Torr, the laser beams 20 are focused and scanned to heat the defect part where the correcting substance 10 is decomposed to deposit Cr which forms a light screening film over the defect part. By this constitution, the correction film having the god wear and chemical resistances can be formed rapidly. |
