发明名称 |
Direct imaging process for forming resist pattern on a surface, and use thereof in fabricating printed circuit boards. |
摘要 |
<p>A process is described for the direct production of an imaged pattern of resist on a substrate surface (such as a pattern of etch-resistant organic resin material on the surface of a copper-clad dielectric in connection with a printed circuit board (PCB) fabrication process), which process utilizes thermo-resists rather than photoresists, i.e., compositions which undergo thermally-induced, rather than photo-induced, chemical transformations. A film of thermo-resist composition applied to the substrate surface is scanned by a focused heat source (e.g., a thermal laser emitting in the IR region) in a predetermined pattern, without a phototool, to bring about localized thermally-induced chemical transformations of the composition which either directly produce the resist pattern or produce in the film a developable latent image of the pattern. <IMAGE></p> |
申请公布号 |
EP0557138(A2) |
申请公布日期 |
1993.08.25 |
申请号 |
EP19930303542 |
申请日期 |
1993.05.07 |
申请人 |
MACDERMID, INCORPORATED |
发明人 |
GRUNWALD, JOHN;GAL, CHAVA;HIRSH, SHULAMIT;MOZEL, JACOB |
分类号 |
G03F7/004;B41M5/36;C08G59/50;G03F7/016;G03F7/038;G03F7/039;G03F7/20;H05K3/00;H05K3/06;H05K3/18;H05K3/28;H05K3/46 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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