发明名称 METHOD FOR EMBOSSING HOLOGRAMS
摘要 PCT No. PCT/NL90/00179 Sec. 371 Date Jun. 24, 1991 Sec. 102(e) Date Jun. 24, 1991 PCT Filed Nov. 29, 1990 PCT Pub. No. WO91/08524 PCT Pub. Date Jun. 13, 1991.Method for producing a material embodying an interference pattern, in which there is solvent-coated a transparent, thermoformable lacquer on one side of a base film, which lacquer is capable of forming a releasable direct bond with the base film. The lacquer is dried so as to form a solid lacquer layer. An interference pattern is formed by embossing the side of the solid lacquer layer which faces away from the base film with a printing device carrying the negative of the interference pattern. The embossed side of the lacquer layer is clad with a metal layer. A substrate is glued onto the metal layer, and the base film is released from the lacquer layer. A second base film is provided with a second transparent lacquer layer, and an interference pattern is introduced in this second lacquer layer. Then the second lacquer layer is applied by means of a transparent glue onto the first lacquer layer, and the second base film is removed.
申请公布号 US5238516(A) 申请公布日期 1993.08.24
申请号 US19910691033 申请日期 1991.06.24
申请人 KONINKLIJKE EMBALLAGE INDUSTRIE VAN LEER B.V. 发明人 VAN SUYLEKOM, GIJSBERTUS;VAN DER LAAN, EDWARD J.
分类号 B29C43/22;B29C59/04;G03H1/02;G03H1/04;G03H1/18 主分类号 B29C43/22
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