MANUFACTURE OF BOTTOM RESIST

摘要

PURPOSE: To produce a double layer O2 /RIE(Reactive Ion Etching) based bottom resist satisfying all necessary conditions setted to such a kind of a resist and particularly capable of being easily removed. CONSTITUTION: The bottom resist is produced by applying a lacquer layer consisting of an aromatic-containing base polymer, a reticulating agent and an acid generating material on a substrate, exposing with floodlamp the lacquer layer to liberate a strong acid from the acid generating material in the surface zone of the layer and curing by heating.