| 摘要 |
PURPOSE:To obtain the subject large-sized optical part having a nearly microlens group at a low cost with good productivity by forming a desired resist pattern in contact with a substrate to be etched, etching the substrate to be etched and then removing the resist. CONSTITUTION:A substrate 20 to be etched is provided with a resist 11 of a desired pattern in contact therewith and then dissolved (30; an etching solution, 40; an etching vessel) by chemical reaction, dissolved by electrochemical reaction and/or etched by a physical means. The resist 11 is subsequently removed (60; a resist stripping agent, 61; a resist stripping vessel) to afford the objective optical part 50 having a microlens group 51. |
