| 摘要 |
<p>PURPOSE:To provide the pattern formation which leaves no unnecessary color resist layer owing to development in a color filter pattern forming process and obtains a sharp color filter pattern. CONSTITUTION:A color resist solution is applied on a glass substrate 10 and heated and dried to form a color resist layer 11, thereby forming an oxygen shield film. For the purpose, a PVA solution is applied, and heated and dried to form a PVA layer 12, and exposure using a mask pattern 15, baking, and development are carried out to form the color filter pattern. In this color filter pattern forming process, 1.0-1.5wt.% ammonium dichromate is mixed with the PVA solution for the oxygen shield film to form the color filter pattern 11a.</p> |
