发明名称 |
REED FRAME MATERIAL AND ITS PRODUCTION |
摘要 |
PURPOSE:To provide a reed frame material capable of wire bonding in the atmosphere and inexpensively being surface-treated. CONSTITUTION:The reed frame material used for transistors or ICs or the like has a recrystallized structure 15 made by heat-treating a silver layer 11 provided on the uppermost surface of a base material 14 after coating or a rolling structure made by rolling the silver layer after coating and the reed frame material like this is obtained by heat-treating the silver applied >=0.3mum on the surface of the base material 14 in an inert gas atmosphere or reducing atmosphere at a temp of >=200 deg.C and below the softening point of the base material for >=5sec or by annealing the silver applied by >=0.3mum on the surface of the base material in an inert gas atmosphere or reducing atmosphere at 400-800 deg.C for >=5sec before final rolling process. |
申请公布号 |
JPH05209256(A) |
申请公布日期 |
1993.08.20 |
申请号 |
JP19920013919 |
申请日期 |
1992.01.29 |
申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
NAGABUCHI YOJI;ITO HISATOSHI;OGAWA YOSHIAKI |
分类号 |
C22F1/14;C22F1/00;H01L23/50 |
主分类号 |
C22F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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