发明名称 Radiation sensitive compositions and processes.
摘要 <p>A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.</p>
申请公布号 EP0555749(A1) 申请公布日期 1993.08.18
申请号 EP19930101634 申请日期 1993.02.03
申请人 SHIPLEY COMPANY INC. 发明人 PAI, DANIEL Y.;RODRIGUEZ STEPHEN S.;CHEETHAM, KEVIN, J.;CALABRESE, GARY, S.;SINTA ROGER F.
分类号 C08G59/40;C08G59/00;C08L63/00;G03F7/004;G03F7/038;H05K3/28 主分类号 C08G59/40
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