| 摘要 |
PURPOSE:To provide the photoresist composition superior in sensitivity, film endurance rate, resolution, heat resistance, resist form, and developability. CONSTITUTION:This composition contains an alkali-soluble resin obtained by polycondensing phenols represented by formula I with the compounds represented by formula II in a molar ratio of 40:60-95:5, and 1,2-quinonediazido compounds represented by formula II. In formulae I and II, each of R1-R3 is, independently, optionally substituted alkyl, aryl, aralkyl, alkenyl, alkoxy, aryloxyl, arylcarbonyl, acyl, II, halogen, nitro, or OH; R4 is H or alkyl; and R5 is hydroxymethyl. |
