| 摘要 |
PURPOSE:To obtain both of coating property and resolution by using such a material which imparts non-Newtonian property to a resist and is swollen with other component in a liquid state of the resist compsn. CONSTITUTION:This resist compsn. (photoresist compsn.) consists of a photosensitive resist component which changes soluble or insoluble with a developer by irradiation of light and a material which gives non-Newtonian property to the resist. As for the material to impart non-Newtonian property, such a material is used that is swollen with one or more kinds of other resist components (monomers, resin, solvent, etc.,) in a liquid state of the resist compsn. The material which imparts non-Newtonian property and is swollen with one or more components is, for example, modified caster oil, fatty acid amide wax, oxidized polyethylene surfactant, polyether-polyester surfactant in a solid state, for example, powder state. |
