| 摘要 |
PURPOSE:To provide the reticule which is a reticule to be used wafer exposing of reducing projection and enables the inspection of the errors in the sizes between the adjacent shot regions of reticule exposing. CONSTITUTION:The reticule 1 is so constituted as to have slits 5 of the spacing to be successively connected on a wafer 6 by wafer exposing at the joints of the shot regions 3 of patterns 4 stretching over the adjacent shot regions 3 of the reticule exposing for producing the reticule 1. The process for production of the reticule consists in forming the slits 5 of the spacing to be successively connected on the wafer 6 by the wafer exposing at the joints of the shot regions 3 of the patterns 4 stretching over the adjacent shot regions 3 of the reticule exposing, measuring the spacing size of the slits 5 and inspecting the errors of the sizes between the shot regions 3. |
