| 摘要 |
PURPOSE:To enable mask data to be enhanced in reliability by a method wherein a light shading pattern is automatically formed so as to enable a phase angle difference between light rays which passed through the edge of a phase shifter pattern and the other light rays which passed through the other region of the phase shifter pattern to be an angle of 180 deg.. CONSTITUTION:A center square 3 is subtracted from an L-shaped phase shifter pattern 1 through a phase shifter light shading type phase shifting method to obtain a figure 2. In succession, the figure 2 is removed from the figure 1 to obtain a figure 3. Then, the figure 3 is simply reduced in size by a length of a to obtain a Cr pattern 4. A phase angle difference between light which passed through the edge 1a (d in width) of the phase shifter pattern 1 and other light which passed through the other region of the phase shifter pattern 1 is set to an angle of 180 deg., and when the Cr pattern 4 is fixed to the center of the shifter pattern 1, a required resist mask pattern 36 can be obtained, so that design and research can be shortened in term. |
