发明名称 SCHOTTKY TYPE PHOTO DETECTING ELEMENT
摘要 <p>PURPOSE:To enlarge photo current per unit area of a Schottky type photo detector by a method wherein an electrode on the metal side consisting of gold, palladium, platinum silicide, etc., is formed on the Si substrate to make the first Schottky junction to be generated, a polycrystalline or a single crystal Si layer is formed thereon to constitute the second Schottky junction, and they are connected to the substrate electrically. CONSTITUTION:An N type region 4 to prevent increase of leakage current and reduction of withstand voltage at the circumference of the Schottky junction 3 to be formed afterward is formed by diffusion in a P type Si substrate 1, a metal or a metal silicide of gold, palladium, platinum silicide, etc., is evaporated on the surface of the substrate 1 to obtain the electrode 2 on the metal side putting the end part on the region 4 thereof, and the first Schottky junction 3 is made to be generated between the substrate 1. Then the P type Si layer 6 consisting of polycrystalline Si or single crystal Si is accumulated on the electrode 2 to make the second Schottky junction 7 to be generated between the electrode 2, the layer 6 is connected to the substrate 1, and an electric power source 5 is provided between the electrode 2 and the substrate 1.</p>
申请公布号 JPS57126178(A) 申请公布日期 1982.08.05
申请号 JP19810013347 申请日期 1981.01.29
申请人 MITSUBISHI DENKI KK 发明人 KIMATA MASAAKI;DENDA MASAHIKO;HIRATA KATSUHIRO;UEMATSU SHIGEYUKI;TSUBOUCHI NATSUO
分类号 H04N5/33;H01L25/04;H01L31/108 主分类号 H04N5/33
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