发明名称 Method for producing flat CVD diamond film
摘要 A chemical vapor deposition method for producing a flat diamond film substantially free of cracks by forming the diamond film on the surface of a substrate having a convex growth surface wherein the radius of curvature is matched with the tensile stress within the diamond coating produced to compensate for distortion when the film is separated from the substrate.
申请公布号 ZA9209237(B) 申请公布日期 1993.08.11
申请号 ZA19920009237 申请日期 1992.11.27
申请人 GENERAL ELECTRIC COMPANY. 发明人 FRIEDEL SIEGFRIED KNEMEYER;DAVID EARL SLUTZ
分类号 B01J19/00;C23C16/01;C23C16/26;C23C16/27;C23C16/458;C30B25/02;C30B25/18;C30B29/04;H01L21/205 主分类号 B01J19/00
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