发明名称 Biasing system for controlling chemical concentration in lamps
摘要 A high intensity discharge lamp system includes an AC supply for a chamber within which a plasma conductor is created to generate light. In order to control the concentrations of charged particles within the chamber and to influence migration thereof, a DC circuit taps power from the AC supply and produces a DC potential which is applied to relatively large-surface components in the vicinity of the plasma chamber. Properly polarized, the large-surface components, such as a reflector and a conductive housing, refractor or door, produces electric fields which either inhibit or encourage migration of the charged particles.
申请公布号 US5235256(A) 申请公布日期 1993.08.10
申请号 US19920836402 申请日期 1992.02.18
申请人 HUBBELL INCORPORATED 发明人 NUCKOLLS, JOE A.
分类号 H01J61/10;H01J61/24;H05B41/19 主分类号 H01J61/10
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